Invention Grant
- Patent Title: System for monitoring haze of a photomask
- Patent Title (中): 用于监控光掩模雾度的系统
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Application No.: US12588490Application Date: 2009-10-16
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Publication No.: US08422760B2Publication Date: 2013-04-16
- Inventor: Dong-gun Lee , Seong-sue Kim , Jae-Hyuck Choi , Jin-sik Jung
- Applicant: Dong-gun Lee , Seong-sue Kim , Jae-Hyuck Choi , Jin-sik Jung
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2008-0102143 20081017
- Main IPC: G06K9/00
- IPC: G06K9/00
Abstract:
A system for monitoring haze of a photomask includes an installation unit in which a photomask is mounted, a light emission unit emitting a light beam to the photomask installed on the installation unit, a detection unit detecting a diffraction pattern of the light beam emitted by the light emission unit and passed through the photomask, and an analysis unit analyzing the diffraction pattern detected by the detection unit.
Public/Granted literature
- US20100111402A1 System for monitoring haze of a photomask Public/Granted day:2010-05-06
Information query
