Invention Grant
- Patent Title: Fill patterning for symmetrical circuits
- Patent Title (中): 填充对称电路图案
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Application No.: US12339407Application Date: 2008-12-19
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Publication No.: US08423942B2Publication Date: 2013-04-16
- Inventor: Jason K. Werkheiser
- Applicant: Jason K. Werkheiser
- Applicant Address: US PA Allentown
- Assignee: Agere Systems LLC
- Current Assignee: Agere Systems LLC
- Current Assignee Address: US PA Allentown
- Agency: Mendelsohn, Drucker & Associates, P.C.
- Agent Yuri Gruzdkov; Steve Mendelsohn
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A fill-placement method, according to which symmetrical fill patterns are used to insert fill tiles into one or more interconnect levels corresponding to symmetrical circuitry. The fill-placement method can be used, for example, in the fabrication of an integrated circuit having at least two complementary portions for which relatively tight circuit-matching requirements need to be met.
Public/Granted literature
- US20100155956A1 FILL PATTERNING FOR SYMMETRICAL CIRCUITS Public/Granted day:2010-06-24
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