Invention Grant
US08425741B2 Ion deposition apparatus having rotatable carousel for supporting a plurality of targets 有权
离子沉积设备具有可旋转的转盘,用于支撑多个靶

Ion deposition apparatus having rotatable carousel for supporting a plurality of targets
Abstract:
This invention relates to a broad beam ion deposition apparatus (100) including an ion source (101), a target (102), a tillable substrate table (103) and an auxiliary port (104). The target (102) is in the form of a carousel which carries a number of targets and the ion source (101) is configured to produce a substantially rectangular section beam (105).
Public/Granted literature
Information query
Patent Agency Ranking
0/0