Invention Grant
- Patent Title: Pellicle for lithography
- Patent Title (中): 光刻胶片
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Application No.: US12929554Application Date: 2011-02-01
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Publication No.: US08426083B2Publication Date: 2013-04-23
- Inventor: Toru Shirasaki
- Applicant: Toru Shirasaki
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agent Manabu Kanesaka
- Priority: JP2010-025323 20100208
- Main IPC: G03F1/62
- IPC: G03F1/62 ; G03F1/64

Abstract:
There is provided a pellicle in which the adhesive layer bearing the pellicle membrane is molded so flatly that the flatness of the pellicle as measured across the membrane is 10 micrometers or smaller, and this is preferably accompanied by an improved flatness of mask-bonding adhesive layer (agglutinant layer), which can be 15 micrometers to 10 micrometers or even smaller.
Public/Granted literature
- US20110195350A1 Pellicle for lithography Public/Granted day:2011-08-11
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