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US08426083B2 Pellicle for lithography 有权
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Pellicle for lithography
Abstract:
There is provided a pellicle in which the adhesive layer bearing the pellicle membrane is molded so flatly that the flatness of the pellicle as measured across the membrane is 10 micrometers or smaller, and this is preferably accompanied by an improved flatness of mask-bonding adhesive layer (agglutinant layer), which can be 15 micrometers to 10 micrometers or even smaller.
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