Invention Grant
- Patent Title: Positive-type photosensitive composition
- Patent Title (中): 正型光敏组合物
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Application No.: US12991690Application Date: 2009-05-13
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Publication No.: US08426107B2Publication Date: 2013-04-23
- Inventor: Motoki Takahashi , Toshiyuki Ogata , Christopher Cordonier , Akimasa Nakamura , Tetsuya Shichi , Teruhiro Uematsu
- Applicant: Motoki Takahashi , Toshiyuki Ogata , Christopher Cordonier , Akimasa Nakamura , Tetsuya Shichi , Teruhiro Uematsu
- Applicant Address: JP Kawasaki-shi JP Nagoya-shi
- Assignee: Tokyo Ohka Kogyo Co., Ltd.,Central Japan Railway Company
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.,Central Japan Railway Company
- Current Assignee Address: JP Kawasaki-shi JP Nagoya-shi
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JP2008-126793 20080514
- International Application: PCT/JP2009/058937 WO 20090513
- International Announcement: WO2009/139421 WO 20091119
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004 ; B32B3/10

Abstract:
Disclosed is a positive-type photosensitive composition which can form a metal compound film pattern at high resolution and with less affection by organic residues. The positive-type photosensitive composition comprises: a metal complex component (A) which can form a metal compound film when applied and subsequently fired; and a photosensitizing agent (B). In the composition, a ligand in the component (A) is preferably a multidentate ligand having an aromatic compound as its skeleton. According to this construction, even a composition containing substantially no photosensitive resin can impart photosensitivity and a metal compound film pattern can be formed readily.
Public/Granted literature
- US20110064913A1 POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION Public/Granted day:2011-03-17
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