Invention Grant
- Patent Title: Non-volatile semiconductor storage device and method of manufacturing the same
- Patent Title (中): 非易失性半导体存储装置及其制造方法
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Application No.: US13365600Application Date: 2012-02-03
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Publication No.: US08426276B2Publication Date: 2013-04-23
- Inventor: Masaru Kito , Ryota Katsumata , Masaru Kidoh , Hiroyasu Tanaka , Yoshiaki Fukuzumi , Hideaki Aochi , Yasuyuki Matsuoka
- Applicant: Masaru Kito , Ryota Katsumata , Masaru Kidoh , Hiroyasu Tanaka , Yoshiaki Fukuzumi , Hideaki Aochi , Yasuyuki Matsuoka
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-280091 20071029
- Main IPC: H01L21/8234
- IPC: H01L21/8234

Abstract:
A non-volatile semiconductor storage device has a plurality of memory strings with a plurality of electrically rewritable memory cells connected in series. Each of the memory strings includes: a first columnar semiconductor layer extending in a direction perpendicular to a substrate; a charge accumulation layer formed on the first columnar semiconductor layer via a first air gap and accumulating charges; a block insulation layer contacting the charge accumulation layer; and a plurality of first conductive layers contacting the block insulation layer.
Public/Granted literature
- US20120135595A1 NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2012-05-31
Information query
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