Invention Grant
- Patent Title: Adhesive composition and adhesive film
- Patent Title (中): 粘合剂组合物和粘合剂膜
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Application No.: US12516363Application Date: 2007-09-27
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Publication No.: US08426543B2Publication Date: 2013-04-23
- Inventor: Takahiro Asai , Koichi Misumi , Atsushi Miyanari , Yoshihiro Inao , Akihiko Nakamura
- Applicant: Takahiro Asai , Koichi Misumi , Atsushi Miyanari , Yoshihiro Inao , Akihiko Nakamura
- Applicant Address: JP Kanagawa
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kanagawa
- Agency: Renner, Otto, Boisselle & Sklar, LLP
- Priority: JP2006-322346 20061129
- International Application: PCT/JP2007/068772 WO 20070927
- International Announcement: WO2008/065801 WO 20080605
- Main IPC: C08F20/10
- IPC: C08F20/10

Abstract:
An adhesive composition of the present invention includes, as a main component, a polymer produced by copolymerization of a monomer composition including: styrene; a (meth)acrylic acid alkyl ester having a chain structure; a (meth)acrylic acid ester having an aliphatic ring; and a (meth)acrylic acid ester having an aromatic ring, wherein: the styrene is contained in a range of 40 to 69 parts by mass; the (meth)acrylic acid alkyl ester having the chain structure is contained in a range of 20 to 30 parts by mass; the (meth)acrylic acid ester having the aliphatic ring is contained in a range of 10 to 25 parts by mass; and the (meth)acrylic acid ester having the aromatic ring is contained in a range of 1 to 5 parts by mass, where the total amount of the above components is 100 parts by mass. This allows for provision of an adhesive composition having high adhesive strength under high-temperature environment, as well as high heat resistance, high alkali resistance, and easiness in stripping from semiconductor wafers and the like even after high-temperature processing.
Public/Granted literature
- US20100069593A1 ADHESIVE COMPOSITION AND ADHESIVE FILM Public/Granted day:2010-03-18
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