Invention Grant
- Patent Title: Connecting terminal, semiconductor package using connecting terminal and method for manufacturing semiconductor package
- Patent Title (中): 连接端子,使用连接端子的半导体封装和制造半导体封装的方法
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Application No.: US12597835Application Date: 2008-04-23
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Publication No.: US08426742B2Publication Date: 2013-04-23
- Inventor: Yoshinori Ejiri , Shuichi Hatakeyama , Shigeharu Arike , Kiyoshi Hasegawa
- Applicant: Yoshinori Ejiri , Shuichi Hatakeyama , Shigeharu Arike , Kiyoshi Hasegawa
- Applicant Address: JP Tokyo
- Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Griffin & Szipl, P.C.
- Priority: JPP2007-118732 20070427; JPP2008-097381 20080403
- International Application: PCT/JP2008/057859 WO 20080423
- International Announcement: WO2008/136327 WO 20081113
- Main IPC: H01L23/498
- IPC: H01L23/498 ; H01L21/60 ; H01B1/02

Abstract:
The connection reliability of connecting terminals with displacement gold plating films is improved by connecting terminals comprising a conductive layer, an electroless nickel plating film, a first palladium plating film which is a displacement or electroless palladium plating film with a purity of 99% by mass or greater, a second palladium plating film which is an electroless palladium plating film with a purity of at least 90% by mass and less than 99% by mass, and a displacement gold plating film, wherein the electroless nickel plating film, the first palladium plating film, the second palladium plating film and the displacement gold plating film are laminated in that order on one side of the conductive layer, and the displacement gold plating film is situated on the uppermost surface layer on the opposite side from the conductive layer.
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