Invention Grant
- Patent Title: Electrical contact for vacuum valve
- Patent Title (中): 真空阀电接触
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Application No.: US12354252Application Date: 2009-01-15
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Publication No.: US08426754B2Publication Date: 2013-04-23
- Inventor: Shigeru Kikuchi , Satoru Kajiwara , Masato Kobayashi , Misuk Yamazaki
- Applicant: Shigeru Kikuchi , Satoru Kajiwara , Masato Kobayashi , Misuk Yamazaki
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Mattingly & Malur, PC
- Priority: JP2008-009969 20080121
- Main IPC: H01H1/02
- IPC: H01H1/02

Abstract:
An electrical contact comprising a contact layer for making a contact with an opposite electrical contact and a high conductive layer in an opposite side of the contact layer, the layers being integrally connected to each other, wherein the contact layer contains Cr, Cu and Te, and the high conductive layer contains copper as a main component, and wherein the high conductive layer is provided with a means for suppressing warp of the contact layer at the time of turning on of the contacts.
Public/Granted literature
- US20090184274A1 ELECTRICAL CONTACT FOR VACUUM VALVE Public/Granted day:2009-07-23
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