A semiconductor charge storage device includes a semiconductor substrate having a surface region. The semiconductor substrate is characterized by a first conductivity type. A charge trapping material overlies and is in contact with at least a portion of the surface region of the semiconductor substrate. The charge trapping material is characterized by a first dielectric constant and by a first charge trapping capability. The first dielectric constant is higher than a dielectric constant associated with silicon oxide. A dielectric material overlies and is in contact with at least a portion of the charge trapping material. The dielectric material is formed using a conversion of a portion of the charge trapping material for providing a second charge trapping capability. The device also includes a conductive material overlying the second dielectric. The conductive material is capable of receiving an electrical signal to cause electrical charges being trapped in the semiconductor charge storage device.