Invention Grant
- Patent Title: Insulated gate bipolar transistor
- Patent Title (中): 绝缘栅双极晶体管
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Application No.: US12732685Application Date: 2010-03-26
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Publication No.: US08426944B2Publication Date: 2013-04-23
- Inventor: Shuji Yoneda , Kenji Sawamura
- Applicant: Shuji Yoneda , Kenji Sawamura
- Applicant Address: US AZ Phoenix JP Gunma
- Assignee: Semiconductor Components Industries, LLC,Sanyo Semiconductor Co., Ltd.
- Current Assignee: Semiconductor Components Industries, LLC,Sanyo Semiconductor Co., Ltd.
- Current Assignee Address: US AZ Phoenix JP Gunma
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2009-077063 20090326
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
In some embodiments, an insulated gate bipolar transistor includes a drift layer, insulation gates formed at a principle surface portion of the drift layer, base regions formed in a between-gate region, an emitter region formed in the base region so as to be adjacent to the insulation gate, an emitter electrode connected to the emitter region, a collector layer formed at the other side of the principle surface portion of the drift layer, and a collector electrode connected to the collector layer. The conductive type base regions are separated with each other by the drift layers, and the drift layer and the emitter electrode are insulated by an interlayer insulation film.
Public/Granted literature
- US20100244091A1 INSULATED GATE BIPOLAR TRANSISTOR Public/Granted day:2010-09-30
Information query
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