Invention Grant
- Patent Title: Lithographic apparatus and methods
- Patent Title (中): 平版印刷设备和方法
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Application No.: US12398403Application Date: 2009-03-05
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Publication No.: US08427627B2Publication Date: 2013-04-23
- Inventor: Koen Kivits , Hans Jansen , Vasco Miguel Matias Serrao
- Applicant: Koen Kivits , Hans Jansen , Vasco Miguel Matias Serrao
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/32
Abstract:
A system for cleaning a limited area of a top surface of a substrate table or an object positioned on a top surface of a substrate table is disclosed. The optical system used during normal imaging is adjusted to limit the cross-sectional area of a radiation beam to form a cleaning radiation beam which impinges on the limited area.
Public/Granted literature
- US20090296052A1 LITHOGRAPHIC APPARATUS AND METHODS Public/Granted day:2009-12-03
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