Invention Grant
- Patent Title: Two-dimensional layout for use in a complex structure
- Patent Title (中): 用于复杂结构的二维布局
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Application No.: US13181380Application Date: 2011-07-12
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Publication No.: US08434208B2Publication Date: 2013-05-07
- Inventor: Stephen C. Jacobsen , David P. Marceau
- Applicant: Stephen C. Jacobsen , David P. Marceau
- Applicant Address: US MA Waltham
- Assignee: Raytheon Company
- Current Assignee: Raytheon Company
- Current Assignee Address: US MA Waltham
- Agency: Thorpe North & Western LLP
- Main IPC: B28B5/00
- IPC: B28B5/00 ; B29C63/00 ; B29C65/00 ; B29C69/00 ; B21D39/03 ; B23P11/00

Abstract:
A method for manufacturing a complex structure from a two-dimensional layout, the method comprising: (a) obtaining a support plate having a pre-determined, patterned recess formed in a surface thereof; (b) depositing a first series of individual flexible interconnects into the recess, the flexible interconnects being aligned parallel to one another in a common plane and supported by the support plate; (c) adhering, with adhering means, at least one rigid member to each of the flexible interconnects of the first series; (d) adhering, with adhering means, a second series of individual flexible interconnects to the rigid members to form a plurality of stations, wherein each of the second series of flexible interconnects is adhered to two rigid members of adjacent flexible interconnects of the first series, the flexible interconnects of the second series being formed perpendicular to the flexible interconnects of the first series; (e) curing the adhering means to form an assembled, layered structure; (f) removing the layered structure from the support plate; and (g) folding, systematically, the layered structure on itself and causing at least some of the stations to be supported about a central spine in a segmented manner.
Public/Granted literature
- US20110268914A1 Two-Dimensional Layout For Use In A Complex Structure Public/Granted day:2011-11-03
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