Invention Grant
- Patent Title: Pattern projection light source and compound-eye distance measurement apparatus
- Patent Title (中): 图案投影光源和复眼测距仪
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Application No.: US12302432Application Date: 2007-05-21
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Publication No.: US08434874B2Publication Date: 2013-05-07
- Inventor: Norihiro Imamura
- Applicant: Norihiro Imamura
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Hamre, Schumann, Mueller & Larson, P.C.
- Priority: JP2006-149184 20060530
- International Application: PCT/JP2007/060336 WO 20070521
- International Announcement: WO2007/138904 WO 20071206
- Main IPC: G03B21/14
- IPC: G03B21/14 ; G01C1/06 ; G01B11/14 ; G02B27/10

Abstract:
A pattern projection light source is disclosed in which a light source (2a); a plurality of mask regions (5) in each of which a light-transmitting portion that transmits light from the light source therethrough is formed in a predetermined pattern; and a plurality of lenses (7) that each form an image of the predetermined pattern of the light-transmitting portion at a predetermined distance are arranged in this order. Since the pattern projection light source includes a plurality of projection optical systems each including a mask region and a lens, a compact and thin pattern projection light source can be realized. Moreover, provision of a plurality of lenses makes it possible to increase the imaging range of a pattern image. Furthermore, an image of the pattern of the light-transmitting portion can be formed clearly on the object.
Public/Granted literature
- US20090185157A1 PATTERN PROJECTION LIGHT SOURCE AND COMPOUND-EYE DISTANCE MEASUREMENT APPARATUS Public/Granted day:2009-07-23
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