Invention Grant
US08434937B2 Method and apparatus for detecting the substrate temperature in a laser anneal system
有权
用于检测激光退火系统中的衬底温度的方法和装置
- Patent Title: Method and apparatus for detecting the substrate temperature in a laser anneal system
- Patent Title (中): 用于检测激光退火系统中的衬底温度的方法和装置
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Application No.: US12475404Application Date: 2009-05-29
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Publication No.: US08434937B2Publication Date: 2013-05-07
- Inventor: Blake Koelmel , Abhilash J. Mayur
- Applicant: Blake Koelmel , Abhilash J. Mayur
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: G01J5/02
- IPC: G01J5/02 ; H01L21/00

Abstract:
Embodiments of the invention provide a method and an apparatus for detecting the temperature of a substrate surface. In one embodiment, a method for measuring the temperature is provided which includes exposing the surface of the substrate to a laser beam radiating from a laser source, radiating emitted light from a portion of the surface of the substrate, through the shadow ring, and towards a thermal sensor, and determining the temperature of the portion of the surface of the substrate from the emitted light. The substrate may be disposed on a substrate support within a treatment region and a shadow ring may be disposed between the laser source and the surface of the substrate. The shadow ring may be selectively opaque to the laser beam and transparent to the emitted light.
Public/Granted literature
- US20090296774A1 METHOD AND APPARATUS FOR DETECTING THE SUBSTRATE TEMPERATURE IN A LASER ANNEAL SYSTEM Public/Granted day:2009-12-03
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