Invention Grant
- Patent Title: Apparatus and method for coating a substrate
- Patent Title (中): 用于涂覆基底的装置和方法
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Application No.: US11913580Application Date: 2006-04-27
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Publication No.: US08435352B2Publication Date: 2013-05-07
- Inventor: Johannes Alphonsus Franciscus Maria Schade Van Westrum , Laurent Christophe Bernard Baptiste , Gerardus Gleijm
- Applicant: Johannes Alphonsus Franciscus Maria Schade Van Westrum , Laurent Christophe Bernard Baptiste , Gerardus Gleijm
- Applicant Address: NL Ijmuiden
- Assignee: Tata Steel Nederland Technology BV
- Current Assignee: Tata Steel Nederland Technology BV
- Current Assignee Address: NL Ijmuiden
- Agency: Novak Druce Connolly Bove + Quigg, LLP
- Priority: EP05076265 20050531
- International Application: PCT/EP2006/003924 WO 20060427
- International Announcement: WO2006/128532 WO 20061207
- Main IPC: C23C16/00
- IPC: C23C16/00

Abstract:
An apparatus for coating a substrate using physical vapor deposition, including a vacuum chamber wherein a coil is placed for keeping an amount of conductive material in levitation and for heating and evaporating that material, using a varying electric current in the coil. Isolating member are placed in the coil to isolate the coil from the levitated material. The isolating member is part of a container made of non-conductive material. The container has one or more openings for guiding evaporated conductive material to the substrate to be coated. A method for coating a substrate using physical vapor deposition is also presented.
Public/Granted literature
- US20080280066A1 Apparatus and Method for Coating a Substrate Public/Granted day:2008-11-13
Information query
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