Invention Grant
- Patent Title: Device and method for wet treating disc-like substrates
- Patent Title (中): 用于湿处理盘状基底的装置和方法
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Application No.: US13415229Application Date: 2012-03-08
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Publication No.: US08435356B2Publication Date: 2013-05-07
- Inventor: Rainer Obweger , Alexander Pfeuffer , Martin Köffler , Alexander Lippert
- Applicant: Rainer Obweger , Alexander Pfeuffer , Martin Köffler , Alexander Lippert
- Applicant Address: AT Villach
- Assignee: Lam Research AG
- Current Assignee: Lam Research AG
- Current Assignee Address: AT Villach
- Agency: Young & Thompson
- Priority: ATA970/2003 20030624
- Main IPC: B08B3/12
- IPC: B08B3/12

Abstract:
A method for wet treatment of wafers includes a first plate and a second plate substantially parallel to the first plate, and a wafer is held between the first and the second plate substantially parallel. A first dispenser introduces fluid into a first gap between the first plate and the wafer when being treated, and a second dispenser introduces fluid into a second gap between the second plate and the wafer when being treated. At least one vibrating element is acoustically coupled to at least the second plate, and a holder and the second plate are rotated relative to each other about an axis substantially perpendicular to the second plate.
Public/Granted literature
- US20120167914A1 DEVICE AND METHOD FOR WET TREATING DISC-LIKE SUBSTRATES Public/Granted day:2012-07-05
Information query
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