Invention Grant
US08435399B2 Formation of patterned media by selective anodic removal followed by targeted trench backfill 有权
通过选择性阳极去除形成图案化介质,然后进行靶向沟槽回填

Formation of patterned media by selective anodic removal followed by targeted trench backfill
Abstract:
A method is disclosed for defining discrete magnetic and non-magnetic regions on the magnetic film layer of a storage media substrate. The method applies anodic oxidation of a cobalt-containing magnetic film layer to remove cobalt, followed by controlled deposition of a non-magnetic matrix into the regions where the cobalt has been removed. Deposition may either be electrodeposition, collimated vacuum deposition, or other methods depending upon the composition of the non-magnetic matrix being deposited. The method may be performed in a single electrochemical cell.
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