Invention Grant
- Patent Title: Nanofabrication process and nanodevice
- Patent Title (中): 纳米制造工艺和纳米设备
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Application No.: US12625077Application Date: 2009-11-24
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Publication No.: US08435415B2Publication Date: 2013-05-07
- Inventor: Samuel Martin Stavis , Elizabeth Arlene Strychalski , Michael Gaitan
- Applicant: Samuel Martin Stavis , Elizabeth Arlene Strychalski , Michael Gaitan
- Applicant Address: US DC Washington US NY Ithaca
- Assignee: The United States of America, as represented by the Secretary of Commerce, the National Institute of Standards and Technology,Cornell University—Cornell Center for Technology, Enterprise & Commercialization
- Current Assignee: The United States of America, as represented by the Secretary of Commerce, the National Institute of Standards and Technology,Cornell University—Cornell Center for Technology, Enterprise & Commercialization
- Current Assignee Address: US DC Washington US NY Ithaca
- Agency: Carlson, Gaskey & Olds
- Main IPC: B44C1/22
- IPC: B44C1/22 ; C23F1/00
Abstract:
A nanofabrication process for use with a photoresist that is disposed on a substrate includes the steps of exposing the photoresist to a grayscale radiation pattern, developing the photoresist to remove a irradiated portions and form a patterned topography having a plurality of nanoscale critical dimensions, and selectively etching the photoresist and the substrate to transfer a corresponding topography having a plurality of nanoscale critical dimensions into the substrate.
Public/Granted literature
- US20110123771A1 NANOFABRICATION PROCESS AND NANODEVICE Public/Granted day:2011-05-26
Information query
