Invention Grant
US08435418B2 Ion etching of growing InP nanocrystals using microwave 有权
使用微波对生长InP纳米晶体的离子蚀刻

Ion etching of growing InP nanocrystals using microwave
Abstract:
High quantum yield InP nanocrystals are used in the bio-technology, bio-medical, and photovoltaic, specifically IV, III-V and III-VI nanocrystal technological applications. InP nanocrystals typically require post-generation HF treatment. Combining microwave methodologies with the presence of a fluorinated ionic liquid allows Fluorine ion etching without the hazards accompanying HF. Growing the InP nanocrystals in the presence of the ionic liquid allows in-situ etching to be achieved. The optimization of the PL QY is achieved by balancing growth and etching rates in the reaction.
Public/Granted literature
Information query
Patent Agency Ranking
0/0