Invention Grant
- Patent Title: Mask blank, transfer mask, and methods of manufacturing the same
- Patent Title (中): 掩模空白，转印掩模及其制造方法
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Application No.: US12875783Application Date: 2010-09-03
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Publication No.: US08435704B2Publication Date: 2013-05-07
- Inventor: Osamu Nozawa , Hiroaki Shishido
- Applicant: Osamu Nozawa , Hiroaki Shishido
- Applicant Address: JP Tokyo
- Assignee: Hoya Corporation
- Current Assignee: Hoya Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2010-079327 20100330
- Main IPC: G03F1/22
- IPC: G03F1/22
Abstract:
In a mask blank for manufacturing a transfer mask adapted to exposure light having a wavelength of 200 nm or less, the mask blank has a light-shielding film on a transparent substrate. The light-shielding film is made of a material containing tantalum as a main metal component and includes a highly oxidized layer which has an oxygen content of 60 at % or more and which is formed as a surface layer of the light-shielding film, that is placed on a side opposite to a transparent substrate side.
Public/Granted literature
- US20110244373A1 MASK BLANK, TRANSFER MASK, AND METHODS OF MANUFACTURING THE SAME Public/Granted day:2011-10-06
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