Invention Grant
US08435717B2 Compound for photoacid generator, resist composition using the same, and pattern-forming method
有权
用于光致酸发生剂的组合物，使用其的抗蚀剂组合物和图案形成方法
- Patent Title: Compound for photoacid generator, resist composition using the same, and pattern-forming method
- Patent Title (中): 用于光致酸发生剂的组合物，使用其的抗蚀剂组合物和图案形成方法
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Application No.: US12527362Application Date: 2008-02-14
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Publication No.: US08435717B2Publication Date: 2013-05-07
- Inventor: Yuji Hagiwara , Jonathan Joachim Jodry , Satoru Narizuka , Kazuhiko Maeda
- Applicant: Yuji Hagiwara , Jonathan Joachim Jodry , Satoru Narizuka , Kazuhiko Maeda
- Applicant Address: JP Ube-shi
- Assignee: Central Glass Company, Limited
- Current Assignee: Central Glass Company, Limited
- Current Assignee Address: JP Ube-shi
- Agency: Crowell & Moring LLP
- Priority: JP2007-034834 20070215; JP2007-066236 20070315; JP2007-143879 20070530; JP2007-143880 20070530
- International Application: PCT/JP2008/052410 WO 20080214
- International Announcement: WO2008/099869 WO 20080821
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; G03F7/038 ; G03C1/675 ; G03C1/73
Abstract:
A sulfonic acid onium salt represented by the following formula (1) can be used as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt. In formula (1), R1 represents a monovalent organic group, and Q+ represents a sulfonium cation or iodonium cation.
Public/Granted literature
- US20100035185A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method Public/Granted day:2010-02-11
Information query
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