Invention Grant
- Patent Title: Surface-emitting semiconductor laser and manufacturing method thereof
- Patent Title (中): 表面发射半导体激光器及其制造方法
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Application No.: US12926917Application Date: 2010-12-17
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Publication No.: US08435815B2Publication Date: 2013-05-07
- Inventor: Masaki Shiozaki , Osamu Maeda , Takahiro Arakida , Susumu Sato
- Applicant: Masaki Shiozaki , Osamu Maeda , Takahiro Arakida , Susumu Sato
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Rader, Fishman & Grauer PLLC
- Priority: JP2010-014859 20100126
- Main IPC: B82Y20/00
- IPC: B82Y20/00

Abstract:
A manufacturing method of a surface-emitting semiconductor laser includes the steps of: forming a stacked structure having a lower-multilayer film reflector including a lower oxidizable layer having at least one layer, an active layer having a light emitting region, an upper-multilayer film reflector including an upper oxidizable layer and an upper layer on a substrate in this order; providing a first groove in the upper layer; and providing a second groove including a portion overlapping the first groove in a planar shape and a portion not overlapping the first groove in the stacked structure.
Public/Granted literature
- US20110182315A1 Surface-emitting semiconductor laser and manufacturing method thereof Public/Granted day:2011-07-28
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