Invention Grant
- Patent Title: Programmable resistive memory cell with sacrificial metal
- Patent Title (中): 具有牺牲金属的可编程电阻存储单元
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Application No.: US13348255Application Date: 2012-01-11
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Publication No.: US08435827B2Publication Date: 2013-05-07
- Inventor: Venkatram Venkatasamy , Ming Sun , Dadi Setiadi
- Applicant: Venkatram Venkatasamy , Ming Sun , Dadi Setiadi
- Applicant Address: US CA Cupertino
- Assignee: Seagate Technology LLC
- Current Assignee: Seagate Technology LLC
- Current Assignee Address: US CA Cupertino
- Agency: Mueting Raasch & Gebhardt PA
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
Programmable metallization memory cells include an electrochemically active electrode and an inert electrode and an ion conductor solid electrolyte material between the electrochemically active electrode and the inert electrode. A sacrificial metal is disposed between the electrochemically active electrode and the inert electrode. The sacrificial metal has a more negative standard electrode potential than the filament forming metal.
Public/Granted literature
- US20120104349A1 PROGRAMMABLE RESISTIVE MEMORY CELL WITH SACRIFICIAL METAL Public/Granted day:2012-05-03
Information query
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