Invention Grant
- Patent Title: Method for manufacturing semiconductor device
- Patent Title (中): 制造半导体器件的方法
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Application No.: US12862829Application Date: 2010-08-25
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Publication No.: US08435869B2Publication Date: 2013-05-07
- Inventor: Misao Hironaka , Harumi Nishiguchi , Kyosuke Kuramoto , Masatsugu Kusunoki
- Applicant: Misao Hironaka , Harumi Nishiguchi , Kyosuke Kuramoto , Masatsugu Kusunoki
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Leydig, Voit & Mayer, Ltd.
- Priority: JP2010-012257 20100122
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method for manufacturing a semiconductor device includes forming a semiconductor laminated structure on a substrate as a wafer including semiconductor laser structures; forming a first groove between the semiconductor laser structures on a major surface of the wafer; separating the wafer to laser bars including at least two of the semiconductor laser structures arrayed in a bar shape, after forming the first groove; forming a second groove in the first groove of the laser bars, the second groove having a width no wider than the first groove; and separating one of the laser bars into respective semiconductor lasers along the second groove.
Public/Granted literature
- US20110183453A1 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE Public/Granted day:2011-07-28
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