Invention Grant
- Patent Title: Method and system for binding halide-based contaminants
- Patent Title (中): 用于粘结卤化物基污染物的方法和系统
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Application No.: US13541435Application Date: 2012-07-03
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Publication No.: US08435886B2Publication Date: 2013-05-07
- Inventor: Garo J. Derderian , Cem Basceri , Donald L. Westmoreland
- Applicant: Garo J. Derderian , Cem Basceri , Donald L. Westmoreland
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Fletcher Yoder, P.C.
- Main IPC: C23C16/06
- IPC: C23C16/06 ; C23C16/08 ; H01L21/3205 ; H01L21/44 ; H01L21/4763 ; H01L21/31 ; H01L21/469
Abstract:
A method and apparatus are presented for reducing halide-based contamination within deposited titanium-based thin films. Halide adsorbing materials are utilized within the deposition chamber to remove halides, such as chlorine and chlorides, during the deposition process so that contamination of the titanium-based film is minimized. A method for regenerating the halide adsorbing material is also provided.
Public/Granted literature
- US20120276750A1 METHOD AND SYSTEM FOR BINDING HALIDE-BASED CONTAMINANTS Public/Granted day:2012-11-01
Information query
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