Invention Grant
- Patent Title: Methods for stripping photoresist and/or cleaning metal regions
- Patent Title (中): 剥离光刻胶和/或清洗金属区域的方法
-
Application No.: US11696633Application Date: 2007-04-04
-
Publication No.: US08435895B2Publication Date: 2013-05-07
- Inventor: David Chen , Haruhiro Harry Goto , Martina Martina , Frank Greer , Shamsuddin Alokozai
- Applicant: David Chen , Haruhiro Harry Goto , Martina Martina , Frank Greer , Shamsuddin Alokozai
- Applicant Address: US CA Fremont
- Assignee: Novellus Systems, Inc.
- Current Assignee: Novellus Systems, Inc.
- Current Assignee Address: US CA Fremont
- Agency: Weaver Austin Villeneuve & Sampson LLP
- Main IPC: H01L21/302
- IPC: H01L21/302
Abstract:
Methods are provided for cleaning metal regions overlying semiconductor substrates. A method for removing material from a metal region comprises heating the metal region, forming a plasma from a gas comprising hydrogen and carbon dioxide, and exposing the metal region to the plasma.
Public/Granted literature
- US20080248656A1 METHODS FOR STRIPPING PHOTORESIST AND/OR CLEANING METAL REGIONS Public/Granted day:2008-10-09
Information query
IPC分类:
