Invention Grant
US08436198B2 Fluorine-containing n-alkylsulfonylimide compound, manufacturing method therefor, and method of manufacturing an ionic compound
有权
含氟的正烷基磺酰亚胺化合物及其制造方法以及离子化合物的制造方法
- Patent Title: Fluorine-containing n-alkylsulfonylimide compound, manufacturing method therefor, and method of manufacturing an ionic compound
- Patent Title (中): 含氟的正烷基磺酰亚胺化合物及其制造方法以及离子化合物的制造方法
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Application No.: US13138742Application Date: 2010-03-31
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Publication No.: US08436198B2Publication Date: 2013-05-07
- Inventor: Tsunetoshi Honda , Hiroyuki Yatsuyanagi , Takashi Konishi , Daisuke Takano
- Applicant: Tsunetoshi Honda , Hiroyuki Yatsuyanagi , Takashi Konishi , Daisuke Takano
- Applicant Address: JP Tokyo JP Akita-Shi
- Assignee: Mitsubishi Materials Corporation,Mitsubishi Materials Electronic Chemicals Co., Ltd.
- Current Assignee: Mitsubishi Materials Corporation,Mitsubishi Materials Electronic Chemicals Co., Ltd.
- Current Assignee Address: JP Tokyo JP Akita-Shi
- Agency: Edwards Wildman Palmer LLP
- Agent James E. Armstrong, IV; Nicholas J. DiCeglie, Jr.
- Priority: JP2009-084284 20090331
- International Application: PCT/JP2010/002345 WO 20100331
- International Announcement: WO2010/113492 WO 20101007
- Main IPC: C07C309/05
- IPC: C07C309/05
Abstract:
According to the method for producing fluorine-containing N-alkylsulfonylimide compound, the fluorine-containing N-alkylsulfonylimide compound can be produced safely with a high recovery rate by alkylating fluorine-containing sulfonylimide acid or fluorine-containing sulfonylimide acid salt with dialkylsulfuric acid or dialkylcarbonic acid.
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