Invention Grant
- Patent Title: Preparation unit for lithography machine
- Patent Title (中): 光刻机准备单元
-
Application No.: US12709640Application Date: 2010-02-22
-
Publication No.: US08436324B2Publication Date: 2013-05-07
- Inventor: Hendrik Jan De Jong
- Applicant: Hendrik Jan De Jong
- Applicant Address: NL Delft
- Assignee: Mapper Lithography IP B.V.
- Current Assignee: Mapper Lithography IP B.V.
- Current Assignee Address: NL Delft
- Agency: Hoyng Monegier LLP
- Agent David P. Owen; Coraline J. Haitjema
- Priority: GB0905789.4 20090403
- Main IPC: G21G5/00
- IPC: G21G5/00 ; B25B11/00
Abstract:
A charged particle lithography system comprising a preparation unit. The preparation unit comprises a housing having a first load port for loading and/or unloading a substrate into or out of the housing, a substrate transfer unit for locating the substrate onto a substrate support structure within the housing, and a second load port for loading and/or unloading the substrate support structure supporting the substrate.
Public/Granted literature
- US20100238421A1 Preparation Unit for Lithography Machine Public/Granted day:2010-09-23
Information query
IPC分类:
| G | 物理 |
| G21 | 核物理；核工程 |
| G21G | 化学元素的转变；放射源 |
| G21G5/00 | 通过化学反应进行化学元素的推断转变 |
