Invention Grant
- Patent Title: Semiconductor devices comprising a plurality of gate structures
- Patent Title (中): 包括多个栅极结构的半导体器件
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Application No.: US13050335Application Date: 2011-03-17
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Publication No.: US08436410B2Publication Date: 2013-05-07
- Inventor: Dae-Woong Kang , Sung-Nam Chang , Jin-Joo Kim , Kyong-Joo Lee , Eun-Jung Lee
- Applicant: Dae-Woong Kang , Sung-Nam Chang , Jin-Joo Kim , Kyong-Joo Lee , Eun-Jung Lee
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec, P.A.
- Priority: KR10-2005-0103107 20051031
- Main IPC: H01L29/788
- IPC: H01L29/788

Abstract:
Semiconductor devices are provided. The semiconductor devices may include a plurality of gate structures disposed on a semiconductor substrate, each of the gate structures including a floating gate, an inter-gate dielectric layer, and a control gate. The semiconductor devices may also include liners on opposing sidewalls of adjacent ones of the gate structures. The liners may define a gap. A first width of the gap may be less than a second width of the gap.
Public/Granted literature
- US20110163367A1 Semiconductor Devices Comprising a Plurality of Gate Structures Public/Granted day:2011-07-07
Information query
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