A liquid immersion exposure apparatus includes an optical element through which an exposure beam passes, a first table which is movable relative to the optical element, while holding a substrate and a second table which is movable relative to the optical element while holding a substrate. The optical element is kept in contact with an exposure liquid while the first table and the second table are moved from a first state in which the first table is opposite to the optical element to a second state in which the second table is opposite to the optical element.