Invention Grant
- Patent Title: Method of measuring focus of a lithographic projection apparatus
- Patent Title (中): 测量光刻投影设备的焦点的方法
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Application No.: US13603139Application Date: 2012-09-04
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Publication No.: US08436998B2Publication Date: 2013-05-07
- Inventor: Gerardus Carolus Johannus Hofmans , Hubertus Antonius Geraets , Mark Zellenrath , Sven Gunnar Krister Magnusson
- Applicant: Gerardus Carolus Johannus Hofmans , Hubertus Antonius Geraets , Mark Zellenrath , Sven Gunnar Krister Magnusson
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G01B11/00
- IPC: G01B11/00
Abstract:
A method of measuring focus of a lithographic projection apparatus includes exposure of a photoresist covered test substrate with a plurality of verification fields. Each of the verification fields includes a plurality of verification markers, and the verification fields are exposed using a predetermined focus offset. After developing, an alignment offset for each of the verification markers is measured and translated into defocus data using a transposed focal curve.
Public/Granted literature
- US20130003031A1 METHOD OF MEASURING FOCUS OF A LITHOGRAPHIC PROJECTION APPARATUS Public/Granted day:2013-01-03
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