Invention Grant
- Patent Title: Projection lens system and projector apparatus
- Patent Title (中): 投影镜头系统和投影仪设备
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Application No.: US13444473Application Date: 2012-04-11
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Publication No.: US08437093B2Publication Date: 2013-05-07
- Inventor: Takahiko Matsuo
- Applicant: Takahiko Matsuo
- Applicant Address: JP Suwa-shi, Jagano
- Assignee: Nittoh Kogaku K.K.
- Current Assignee: Nittoh Kogaku K.K.
- Current Assignee Address: JP Suwa-shi, Jagano
- Agency: Thompson Hine LLP
- Priority: JP2011-89088 20110413
- Main IPC: G02B9/12
- IPC: G02B9/12 ; G02B3/02

Abstract:
A projection lens system has first, second and third lens groups. The first lens group with combined focal length f1 has, in order from a screen side, a first negative meniscus lens, a second negative meniscus lens with focal length f12, refractive index n12 and screen side surface radius of curvature R12a, and a negative biconcave lens with focal length f13. A second lens group consists of a positive biconvex lens with a radius of curvature R21b of a surface on a light modulator side of the positive biconvex lens. The system satisfies the following conditions: 1.0
Public/Granted literature
- US20120262803A1 PROJECTION LENS SYSTEM AND PROJECTOR APPARATUS Public/Granted day:2012-10-18
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