Invention Grant
- Patent Title: X-ray shutter arrangement
- Patent Title (中): X光快门装置
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Application No.: US13005229Application Date: 2011-01-12
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Publication No.: US08437451B2Publication Date: 2013-05-07
- Inventor: Wilbert Alexander Van Lemel , Jaap Boksem
- Applicant: Wilbert Alexander Van Lemel , Jaap Boksem
- Applicant Address: NL Almelo
- Assignee: PANalytical B.V.
- Current Assignee: PANalytical B.V.
- Current Assignee Address: NL Almelo
- Agency: Leason Ellis LLP
- Main IPC: G21K1/04
- IPC: G21K1/04
Abstract:
A shutter arrangement for an X-ray housing includes a shutter 10 for example of solid tantalum. In embodiments, the shutter has a through hole 22 and slides between a closed and an open position on the inner face of the X-ray housing, in the open position the through hole 22 aligns with an opening 8 in the housing.
Public/Granted literature
- US20120177180A1 X-RAY SHUTTER ARRANGEMENT Public/Granted day:2012-07-12
Information query
