Invention Grant
- Patent Title: Low-cost passive optical waveguide using Si substrate
- Patent Title (中): 采用Si衬底的低成本无源光波导
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Application No.: US12962223Application Date: 2010-12-07
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Publication No.: US08437585B2Publication Date: 2013-05-07
- Inventor: Yun-Chung N. Na
- Applicant: Yun-Chung N. Na
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agent Kevin A. Reif
- Main IPC: G02B6/10
- IPC: G02B6/10 ; G02B6/12 ; G02B6/30 ; H01L21/302 ; B29D11/00 ; B32B38/06 ; B32B38/10

Abstract:
A passive optical waveguide is solely built on a Si substrate while still maintaining high optical quality. Two side-by-side diamond shaped cavities may be etched into the Si wafer and oxide grown on the inner walls of the cavities until the oxide meets at opposing inner vertices of the diamond shaped cavities. An optical waveguide is formed by the inverted, generally triangular cross-sectional, portion of silicon remaining between the top surface of the wafer and the opposing inner vertices.
Public/Granted literature
- US20120138568A1 LOW-COST PASSIVE OPTICAL WAVEGUIDE USING SI SUBSTRATE Public/Granted day:2012-06-07
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