Invention Grant
- Patent Title: Flow modulating substrates for early light-off
- Patent Title (中): 用于提前熄灭的流动调节底物
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Application No.: US13213755Application Date: 2011-08-19
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Publication No.: US08440155B2Publication Date: 2013-05-14
- Inventor: Mikhail Sergeevich Chivilikhin , David R Heine , Ameya Joshi
- Applicant: Mikhail Sergeevich Chivilikhin , David R Heine , Ameya Joshi
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent Matthew J. Mason
- Main IPC: B01D53/94
- IPC: B01D53/94 ; F01N3/10 ; F01N3/28
Abstract:
An exhaust gas after-treatment system includes at least first and second substrates. The first substrate has a first region and a second region circumferentially surrounding the first region. The first region of the first substrate has a higher average cell density than the average cell density of the second substrate. The system can also include at least a third substrate.
Public/Granted literature
- US20130045148A1 Flow Modulating Substrates For Early Light-Off Public/Granted day:2013-02-21
Information query
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