Invention Grant
- Patent Title: Method for analyzing electrolytic copper plating solution
- Patent Title (中): 电解镀铜液分析方法
-
Application No.: US12903090Application Date: 2010-10-12
-
Publication No.: US08440555B2Publication Date: 2013-05-14
- Inventor: Toshikazu Okubo , Katsuyoshi Naoi , Yuka Yamada
- Applicant: Toshikazu Okubo , Katsuyoshi Naoi , Yuka Yamada
- Applicant Address: JP
- Assignee: Toppan Printing Co., Ltd.
- Current Assignee: Toppan Printing Co., Ltd.
- Current Assignee Address: JP
- Agency: Squire Sanders (US) LLP
- Priority: JP2003-082037 20030325; JP2003-350544 20031009
- Main IPC: H01L21/20
- IPC: H01L21/20

Abstract:
Effective fillability and the uniformity electrodeposition of a copper electroplating solution is judged by determining the time-dependent potential change thereof at a cathode current density of 0.1-20 A/dm2. The potential change is determined at a working electrode rotation of 100-7500 rpm, and the fillability with the solution is judged from the curve profile. In an embodiment of the present invention, the fillability is judged by obtaining the potential change speed in the initial stage of electrolysis and the potential convergent point from the time-dependent potential change curve for a predetermined period of time after the start of the electrolysis.
Public/Granted literature
- US20110025294A1 METHOD FOR ANALYZING ELECTROLYTIC COPPER PLATING SOLUTION Public/Granted day:2011-02-03
Information query
IPC分类: