Invention Grant
US08440775B2 Curable liquid composition, method of coating, inorganic substrate, and semiconductor device
失效
可固化液体组合物,涂布方法,无机基材和半导体器件
- Patent Title: Curable liquid composition, method of coating, inorganic substrate, and semiconductor device
- Patent Title (中): 可固化液体组合物,涂布方法,无机基材和半导体器件
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Application No.: US12525429Application Date: 2008-02-01
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Publication No.: US08440775B2Publication Date: 2013-05-14
- Inventor: Yukinari Harimoto , Maki Itoh , Dimitris Elias Katsoulis
- Applicant: Yukinari Harimoto , Maki Itoh , Dimitris Elias Katsoulis
- Applicant Address: US MI Midland JP Chiyoda-ku, Tokyo
- Assignee: Dow Corning Corporation,Dow Corning Toray Company, Ltd.
- Current Assignee: Dow Corning Corporation,Dow Corning Toray Company, Ltd.
- Current Assignee Address: US MI Midland JP Chiyoda-ku, Tokyo
- Agency: Howard & Howard Attorneys PLLC
- Priority: JP2007-024477 20070202
- International Application: PCT/JP2008/052087 WO 20080201
- International Announcement: WO2008/099767 WO 20080821
- Main IPC: C08G77/12
- IPC: C08G77/12

Abstract:
A curable liquid composition obtained by subjecting hydrogen halosiloxane or hydrogen alkoxysilane to condensation or to hydrolysis and condensation in an organic solvent in which fine polyvalent metal oxide particles with hydroxyl groups are dispersed; a method of forming a hard silica-type layer by applying onto an inorganic substrate the aforementioned composition and then curing the composition; an inorganic substrate with the aforementioned hard silica-type layer; and a semiconductor device comprising the aforementioned inorganic substrate on which a semiconductor layer is formed.
Public/Granted literature
- US20100089451A1 Curable Liquid Composition, Method Of Coating, Inorganic Substrate, and Semiconductor Device Public/Granted day:2010-04-15
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