Invention Grant
- Patent Title: Annealing device
- Patent Title (中): 退火装置
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Application No.: US12680221Application Date: 2008-09-25
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Publication No.: US08440939B2Publication Date: 2013-05-14
- Inventor: Shigeru Kasai , Tomohiro Suzuki , Sumi Tanaka , Masatake Yoneda , Hiroyuki Miyashita
- Applicant: Shigeru Kasai , Tomohiro Suzuki , Sumi Tanaka , Masatake Yoneda , Hiroyuki Miyashita
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Schwab
- Priority: JP2007-251533 20070927; JP2008-009503 20080118
- International Application: PCT/JP2008/067244 WO 20080925
- International Announcement: WO2009/041466 WO 20090402
- Main IPC: H05B3/00
- IPC: H05B3/00

Abstract:
Disclosed is an annealing device that includes a processing chamber into which a wafer is received, a heating source having a plurality of light emitting diodes (LEDs) for emitting a light toward the wafer, which faces the surface of the wafer, and a light transmissive member provided corresponding to the heating source, into which the light from the light emitting elements is transmitted. The heating source has the light emitting elements attached on a support toward the wafer. Each of the light emitting elements is individually covered with a lens layer made of a transparent resin.
Public/Granted literature
- US20100314377A1 ANNEALING DEVICE Public/Granted day:2010-12-16
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