Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
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Application No.: US12882698Application Date: 2010-09-15
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Publication No.: US08441066B2Publication Date: 2013-05-14
- Inventor: Fujio Masuoka , Hiroki Nakamura
- Applicant: Fujio Masuoka , Hiroki Nakamura
- Applicant Address: SG Peninsula Plaza
- Assignee: Unisantis Electronics Singapore Pte Ltd.
- Current Assignee: Unisantis Electronics Singapore Pte Ltd.
- Current Assignee Address: SG Peninsula Plaza
- Agency: Brinks Hofer Gilson & Lione
- Priority: JP2009-214166 20090916; JP2009-297211 20091228
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L29/94 ; H01L31/062 ; H01L31/113 ; H01L31/119

Abstract:
A semiconductor device according to the present invention comprises a first transistor and a second transistor, and functions as an inverter. The first transistor includes an island semiconductor layer, a first gate insulating film surrounding the periphery of the island semiconductor layer, a gate electrode surrounding the periphery of the first gate insulating film, p+-type semiconductor layers formed in the upper and lower part of the island semiconductor layer, respectively. The second transistor includes the gate electrode, a second gate insulating film surrounding a part of the periphery of the gate electrode, an arcuate semiconductor layer contacting a part of the periphery of the second gate insulating film, n+-type semiconductor layers formed in the upper and lower part of the arcuate semiconductor layer, respectively. A first contact electrically connects the p+-type semiconductor layer in the first transistor and the n+-type semiconductor layer in the second transistor.
Public/Granted literature
- US20110062521A1 SEMICONDUCTOR DEVICE Public/Granted day:2011-03-17
Information query
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