Invention Grant
- Patent Title: Method of manufacturing electronic apparatus and electronic apparatus
- Patent Title (中): 制造电子设备和电子设备的方法
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Application No.: US12849675Application Date: 2010-08-03
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Publication No.: US08441085B2Publication Date: 2013-05-14
- Inventor: Koichi Nagasawa , Takashi Yamaguchi , Nobutaka Ozaki , Yasuhiro Kanaya , Hirohisa Takeda , Yasuo Mikami , Yoshifumi Mutoh
- Applicant: Koichi Nagasawa , Takashi Yamaguchi , Nobutaka Ozaki , Yasuhiro Kanaya , Hirohisa Takeda , Yasuo Mikami , Yoshifumi Mutoh
- Applicant Address: JP Aichi
- Assignee: Japan Display West Inc.
- Current Assignee: Japan Display West Inc.
- Current Assignee Address: JP Aichi
- Agency: Dentons US LLP
- Priority: JP2007-304357 20071126
- Main IPC: H01L27/14
- IPC: H01L27/14 ; H01L31/00
Abstract:
An electronic apparatus having a substrate with a bottom gate p-channel type thin film transistor; a resist pattern over the substrate; and a light shielding film operative to block light having a wavelength shorter than 260 nm over at least a channel part of said thin film transistor.
Public/Granted literature
- US20100314621A1 METHOD OF MANUFACTURING ELECTRONIC APPARATUS AND ELECTRONIC APPARATUS Public/Granted day:2010-12-16
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