Invention Grant
- Patent Title: Manufacturing method of solid-state imaging device and solid-state imaging device
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Application No.: US13328459Application Date: 2011-12-16
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Publication No.: US08441088B2Publication Date: 2013-05-14
- Inventor: Yutaka Ooka
- Applicant: Yutaka Ooka
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Rader, Fishman & Grauer PLLC
- Priority: JP2011-000805 20110105
- Main IPC: H01L31/0232
- IPC: H01L31/0232
Abstract:
A manufacturing method of a solid-state imaging device includes: preparing a photoelectric conversion device; forming an insulating layer on a surface of the photoelectric conversion device; forming a wire-grid polarizer on a support base; bonding a forming surface of the wire-grid polarizer on the support base to the insulating layer on the surface of the photoelectric conversion device and removing the support base from the wire-grid polarizer.
Public/Granted literature
- US20120168889A1 MANUFACTURING METHOD OF SOLID-STATE IMAGING DEVICE AND SOLID-STATE IMAGING DEVICE Public/Granted day:2012-07-05
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