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US08441096B2 Fuse of semiconductor device and method for forming the same 有权
半导体器件的保险丝及其形成方法

Fuse of semiconductor device and method for forming the same
Abstract:
A fuse of a semiconductor device comprises: a fuse pattern formed on a semiconductor substrate; an insulating film covering one side of the fuse pattern and including a trench; a conductive line disposed on the insulating film including the trench. The fuse of the semiconductor device prevents generation of cracks in a fuse box by thermal and physical stress, thereby improving reliability of the semiconductor device.
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