Invention Grant
- Patent Title: Semiconductor device with metal dam and fabricating method
- Patent Title (中): 具有金属坝的半导体器件及其制造方法
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Application No.: US12540593Application Date: 2009-08-13
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Publication No.: US08441123B1Publication Date: 2013-05-14
- Inventor: Dong Hee Lee , Min Yoo , Dae Byoung Kang , Bae Yong Kim
- Applicant: Dong Hee Lee , Min Yoo , Dae Byoung Kang , Bae Yong Kim
- Applicant Address: US AZ Chandler
- Assignee: Amkor Technology, Inc.
- Current Assignee: Amkor Technology, Inc.
- Current Assignee Address: US AZ Chandler
- Agency: McAndrews, Held & Malloy, Ltd.
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L23/52 ; H01L29/40

Abstract:
A semiconductor device has a first semiconductor die having at least one metal pillar formed along an inner perimeter and at least one bond pad formed along an outer perimeter. A second semiconductor die has at least one metal pillar. A conductive bump connects the at least one metal pillar of the first semiconductor die to the at least one metal pillar of the second semiconductor die. At least one metal dam is formed on the first semiconductor die between the at least one metal pillar of the first semiconductor die and the at least one bond pad.
Information query
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