Invention Grant
US08441123B1 Semiconductor device with metal dam and fabricating method 有权
具有金属坝的半导体器件及其制造方法

Semiconductor device with metal dam and fabricating method
Abstract:
A semiconductor device has a first semiconductor die having at least one metal pillar formed along an inner perimeter and at least one bond pad formed along an outer perimeter. A second semiconductor die has at least one metal pillar. A conductive bump connects the at least one metal pillar of the first semiconductor die to the at least one metal pillar of the second semiconductor die. At least one metal dam is formed on the first semiconductor die between the at least one metal pillar of the first semiconductor die and the at least one bond pad.
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