Invention Grant
- Patent Title: Lithographic apparatus and method
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Application No.: US12292767Application Date: 2008-11-25
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Publication No.: US08441611B2Publication Date: 2013-05-14
- Inventor: Hendrikus Robertus Marie Van Greevenbroek
- Applicant: Hendrikus Robertus Marie Van Greevenbroek
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/32
Abstract:
A lithographic apparatus is disclosed that is configured to project a patterned beam of radiation onto a target portion of a substrate, the lithographic apparatus including an illumination system configured to condition a beam of radiation, the illumination system having a uniformity correction system located in a plane which, in use, is illuminated with a substantially constant pupil by the illumination system.
Public/Granted literature
- US20090135394A1 Lithographic apparatus and method Public/Granted day:2009-05-28
Information query
