Invention Grant
- Patent Title: System for isolating an exposure apparatus
- Patent Title (中): 隔离曝光装置的系统
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Application No.: US12548895Application Date: 2009-08-27
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Publication No.: US08441615B2Publication Date: 2013-05-14
- Inventor: Fardad A. Hashemi , Douglas C. Watson , Christopher Margeson
- Applicant: Fardad A. Hashemi , Douglas C. Watson , Christopher Margeson
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Roeder & Broder LLP
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03B27/62 ; F16M13/00

Abstract:
A precision assembly (10) for fabricating a substrate (42) includes a precision fabrication apparatus (12), a pedestal assembly (14) and a suspension system (16). The precision fabrication apparatus (12) fabricates the substrate (42). The pedestal assembly (14) supports at least a portion of the fabrication apparatus (12). The suspension system (16) inhibits the transfer of motion between the mounting base (20) and the pedestal assembly (14). The suspension system (16) can include (i) a first boom (380) that is coupled to the mounting base (20) and the pedestal assembly (14), the first boom (380) being pivotable coupled to at least one of the mounting base (20) and the pedestal assembly (14), and (ii) a first resilient assembly (382) that is coupled between the mounting base (20) and at least one of the first boom (380) and the pedestal assembly (14). The first resilient assembly (382) can function similar to a zero length spring over an operational range of the resilient assembly (382). With this design, the components of the precision fabrication apparatus (12) are better protected by the suspension system (16) during a seismic disturbance. This reduces the likelihood of damage and misalignment of the components of the precision fabrication apparatus (12) during the seismic disturbance.
Public/Granted literature
- US20100053589A1 SYSTEM FOR ISOLATING AN EXPOSURE APPARATUS Public/Granted day:2010-03-04
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