Invention Grant
- Patent Title: Internal vapour deposition process
- Patent Title (中): 内部气相沉积工艺
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Application No.: US13082080Application Date: 2011-04-07
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Publication No.: US08443630B2Publication Date: 2013-05-21
- Inventor: Igor Milicevic , Mattheus Jacobus Nicolaas Van Stralen , Johannes Antoon Hartsuiker , Eugen Aldea , Eric Aloysius Kuijpers
- Applicant: Igor Milicevic , Mattheus Jacobus Nicolaas Van Stralen , Johannes Antoon Hartsuiker , Eugen Aldea , Eric Aloysius Kuijpers
- Applicant Address: NL
- Assignee: Draka Comteq, B.V.
- Current Assignee: Draka Comteq, B.V.
- Current Assignee Address: NL
- Agency: Shumaker, Loop & Kendrick, LLP
- Priority: NL2004546 20100413
- Main IPC: C03B37/018
- IPC: C03B37/018

Abstract:
A method for manufacturing a primary preform for optical fibers using an internal vapor deposition process, including the steps of: i) providing a hollow glass substrate tube having a supply side and a discharge side, ii) surrounding at least part of the hollow glass substrate tube by a furnace, iii) supplying a gas flow, doped or undoped, of glass-forming gases to the interior of the hollow glass substrate tube via the supply side thereof, iv) creating a reaction zone in which conditions such that deposition of glass will take place on the interior of the hollow glass tube are created, and v) moving the reaction zone back and forth in longitudinal direction over the hollow glass substrate tube between a reversal point located near the supply side and a reversal point located near the discharge side of the hollow glass substrate tube.
Public/Granted literature
- US20110247369A1 INTERNAL VAPOUR DEPOSITION PROCESS Public/Granted day:2011-10-13
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