Invention Grant
- Patent Title: Method for making privacy film
- Patent Title (中): 制作隐私电影的方法
-
Application No.: US12811457Application Date: 2009-12-29
-
Publication No.: US08444885B2Publication Date: 2013-05-21
- Inventor: Dong-Wook Lee , Soon-Yeel Lee , In-Seok Hwang , Seung-Heon Lee , Sang-Ki Chun , Jie-Hyun Seong
- Applicant: Dong-Wook Lee , Soon-Yeel Lee , In-Seok Hwang , Seung-Heon Lee , Sang-Ki Chun , Jie-Hyun Seong
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge, LLP
- Priority: KR10-2008-0008997 20080129
- International Application: PCT/KR2009/000442 WO 20091229
- International Announcement: WO2009/096722 WO 20090806
- Main IPC: B29D11/00
- IPC: B29D11/00

Abstract:
Provided is a method for making a privacy film. In the method, a nickel mold having desired intagliated patterns are prepared, and a curable resin is then injected into the nickel mold to prepare a master mold. A UV curable resin is injected into the master mold, and then cured to thereby form a film where uneven patterns are formed. A black ink is injected into a concave portion of the film. The method provides advantages such as process simplicity, excellent production efficiency, and low fabrication cost.
Public/Granted literature
- US20100295196A1 METHOD FOR MAKING PRIVACY FILM Public/Granted day:2010-11-25
Information query