Invention Grant
US08445178B2 Composition for radical polymerization and method of forming pattern using the composition
失效
用于自由基聚合的组合物和使用该组合物形成图案的方法
- Patent Title: Composition for radical polymerization and method of forming pattern using the composition
- Patent Title (中): 用于自由基聚合的组合物和使用该组合物形成图案的方法
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Application No.: US12479151Application Date: 2009-06-05
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Publication No.: US08445178B2Publication Date: 2013-05-21
- Inventor: Jong-jin Park , Kwang-hee Lee , Xavier Bulliard , Yun-hyuk Choi , Kwang-sup Lee
- Applicant: Jong-jin Park , Kwang-hee Lee , Xavier Bulliard , Yun-hyuk Choi , Kwang-sup Lee
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2008-0111862 20081111
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004 ; G03F7/40 ; G03F7/027
Abstract:
A composition for radical polymerization includes a photosensitive material, a photoinitiator, a solvent, and a material for adjusting a size of a pattern. A method of forming a pattern using the composition is also disclosed.
Public/Granted literature
- US20100119976A1 COMPOSITION FOR RADICAL POLYMERIZATION AND METHOD OF FORMING PATTERN USING THE COMPOSITION Public/Granted day:2010-05-13
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