Invention Grant
US08445185B2 Method of manufacturing piezoelectric vibrating reed, piezoelectric vibrating reed, piezoelectric vibrator, oscillator, electronic apparatus, and radio-controlled timepiece 失效
制造压电振动片,压电振动片,压电振动器,振荡器,电子设备和无线电控制时计的方法

  • Patent Title: Method of manufacturing piezoelectric vibrating reed, piezoelectric vibrating reed, piezoelectric vibrator, oscillator, electronic apparatus, and radio-controlled timepiece
  • Patent Title (中): 制造压电振动片,压电振动片,压电振动器,振荡器,电子设备和无线电控制时计的方法
  • Application No.: US12950737
    Application Date: 2010-11-19
  • Publication No.: US08445185B2
    Publication Date: 2013-05-21
  • Inventor: Masayuki Kawaguchi
  • Applicant: Masayuki Kawaguchi
  • Applicant Address: JP Chiba
  • Assignee: Seiko Instruments Inc.
  • Current Assignee: Seiko Instruments Inc.
  • Current Assignee Address: JP Chiba
  • Agency: Brinks Hofer Gilson & Lione
  • Priority: JP2009-272376 20091130
  • Main IPC: G03F7/20
  • IPC: G03F7/20 H03H3/02
Method of manufacturing piezoelectric vibrating reed, piezoelectric vibrating reed, piezoelectric vibrator, oscillator, electronic apparatus, and radio-controlled timepiece
Abstract:
There are provided a method of manufacturing a piezoelectric vibrating reed capable of improving the reliability of a product by sorting out a defective product correctly, a piezoelectric vibrating reed, a piezoelectric vibrator having a piezoelectric vibrating reed, an oscillator, an electronic apparatus, and a radio-controlled timepiece. In a resist pattern forming step, a resist pattern is formed by performing contact exposure on a photoresist film in a state where a photomask is in close contact with the photoresist film. Before the resist pattern forming step, a photomask treatment step is included in which when a defect is found in an outer shape equivalent region equivalent to the outer pattern in the photomask, a part of a light shielding film pattern is removed to change the shape of the outer shape equivalent region where damage is present.
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